Trademark: HIQ 2310629
Word
HIQ
Device Descrption:
RING,INCOMPLETE
ID
2310629
Trademark Type
Figurative
Status
Protected: Registered/protected
Application Date
05 July 2022
Registration Date
05 July 2022
Renewal Date
05 July 2032
Owner(s)
Service
Goods and Services:
Class 1:
Ultra-pure gases and special gases and special gas mixtures for industrial, technical, research and science purposes, in particular gases being detection, calibration and testing gases, protective and shielding gases, reactive and active gases, being welding, cutting and scrubbing gases, being process, treatment and work gases, being gases for the treatment and processing of materials, for electronic manufacturing and process technology, in particular clean air, nitrogen, oxygen, carbon dioxide and carbon monoxide, ammonia, and saturated and non-saturated hydrocarbon gases, hydrocarbon compounds, hydrogen, noble gases, isotope gases, and special gaseous substances of various kinds, including nitrous oxide, ammonia and sulphur compounds, silanes, hydrogen compounds, volatile organic compounds, chlorine and fluorine and derivatives thereof (FCHCs/freons), nitrogen compounds, ozone, halogens, halogen compounds, boron, silicon and sulphur compounds, and mixtures of the aforesaid gases.
Ultra-pure gases and special gases and special gas mixtures for industrial, technical, research and science purposes, in particular gases being detection, calibration and testing gases, protective and shielding gases, reactive and active gases, being welding, cutting and scrubbing gases, being process, treatment and work gases, being gases for the treatment and processing of materials, for electronic manufacturing and process technology, in particular clean air, nitrogen, oxygen, carbon dioxide and carbon monoxide, ammonia, and saturated and non-saturated hydrocarbon gases, hydrocarbon compounds, hydrogen, noble gases, isotope gases, and special gaseous substances of various kinds, including nitrous oxide, ammonia and sulphur compounds, silanes, hydrogen compounds, volatile organic compounds, chlorine and fluorine and derivatives thereof (FCHCs/freons), nitrogen compounds, ozone, halogens, halogen compounds, boron, silicon and sulphur compounds, and mixtures of the aforesaid gases.