Trademark: ANGSTROM ENGINEERING 2257853
Word
ANGSTROM ENGINEERING
ID
2257853
Trademark Type
Word
Status
Registered: Registered/protected
Application Date
23 March 2022
Registration Date
23 March 2022
Renewal Date
23 March 2032
Owner(s)
Service
AJ Park
Goods and Services:
Class 1:
Materials, namely, nitrides and polymers, used in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology; materials, namely, metals being alkaline metal, earth metals, metal chlorides, metal oxide powders for industrial purposes, all the aforementioned for use in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology; materials, namely, unprocessed resins or plastics, all the aforementioned for use in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology; materials, namely, ceramic compositions for sintering [granules and powders], ceramic matrix composite [cmc] materials for use in manufacture, compositions for the manufacture of technical ceramics, all the aforementioned for use in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology; materials, namely, metal oxide powders for industrial purposes, non-metal oxide powders for industrial purposes, all the aforementioned for use in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology; materials, namely, organic carbon compounds for industrial purposes, all the aforementioned for use in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology.
Materials, namely, nitrides and polymers, used in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology; materials, namely, metals being alkaline metal, earth metals, metal chlorides, metal oxide powders for industrial purposes, all the aforementioned for use in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology; materials, namely, unprocessed resins or plastics, all the aforementioned for use in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology; materials, namely, ceramic compositions for sintering [granules and powders], ceramic matrix composite [cmc] materials for use in manufacture, compositions for the manufacture of technical ceramics, all the aforementioned for use in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology; materials, namely, metal oxide powders for industrial purposes, non-metal oxide powders for industrial purposes, all the aforementioned for use in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology; materials, namely, organic carbon compounds for industrial purposes, all the aforementioned for use in deposition systems for the purpose of creating thin films for applications in semiconductors, optics and nanotechnology.
Class 7:
Vacuum equipment and systems comprised of vacuum machinery and vacuum pumps for used for thin film deposition, etching and cleaning; deposition system components being parts of deposition machinery, namely, deposition system components, namely, substrate tables, fixturing and carriers, thermal evaporation sources, namely, deposition boats, deposition filaments and crucibles, magnetron sputter sources, electron beam evaporators, nanoparticle generators, ion generators, ion accelerators, charged particle generators for material coating and surface modification purposes, sample handling arms and robots, load lock chambers, thin film thickness measurement equipment, optical measurement equipment, process gas delivery and abatement equipment, vacuum valves, vacuum pumps and pumping systems; vacuum equipment and systems comprised of vacuum machinery and vacuum pumps for use in controlled environment and space simulation; physical and chemical vapor deposition devices being machines for sputter deposition, electron beam evaporation, thermal evaporation, ion beam deposition, ion beam sputter deposition, ion assisted deposition, pulsed laser deposition, atomic layer deposition.
Vacuum equipment and systems comprised of vacuum machinery and vacuum pumps for used for thin film deposition, etching and cleaning; deposition system components being parts of deposition machinery, namely, deposition system components, namely, substrate tables, fixturing and carriers, thermal evaporation sources, namely, deposition boats, deposition filaments and crucibles, magnetron sputter sources, electron beam evaporators, nanoparticle generators, ion generators, ion accelerators, charged particle generators for material coating and surface modification purposes, sample handling arms and robots, load lock chambers, thin film thickness measurement equipment, optical measurement equipment, process gas delivery and abatement equipment, vacuum valves, vacuum pumps and pumping systems; vacuum equipment and systems comprised of vacuum machinery and vacuum pumps for use in controlled environment and space simulation; physical and chemical vapor deposition devices being machines for sputter deposition, electron beam evaporation, thermal evaporation, ion beam deposition, ion beam sputter deposition, ion assisted deposition, pulsed laser deposition, atomic layer deposition.
Class 40:
Custom designing, developing and manufacturing of physical and chemical vapor deposition systems for others; custom designing, developing and manufacturing of vacuum equipment and systems used for thin film deposition, etching and cleaning for others; custom designing, developing and manufacturing vacuum equipment and systems used for controlled environment and space simulation for others.
Custom designing, developing and manufacturing of physical and chemical vapor deposition systems for others; custom designing, developing and manufacturing of vacuum equipment and systems used for thin film deposition, etching and cleaning for others; custom designing, developing and manufacturing vacuum equipment and systems used for controlled environment and space simulation for others.
Class 42:
Engineering services in the field of physical and chemical vapor deposition systems; engineering services in the field of vacuum equipment and systems used for thin film deposition, etching and cleaning; mechanical and chemical engineering services; engineering services in the field of vacuum equipment and systems used for controlled environment and space simulation.
Engineering services in the field of physical and chemical vapor deposition systems; engineering services in the field of vacuum equipment and systems used for thin film deposition, etching and cleaning; mechanical and chemical engineering services; engineering services in the field of vacuum equipment and systems used for controlled environment and space simulation.