Trademark: ENVOSYS 1697547
Word
ENVOSYS
ID
1697547
Trademark Type
Word
Status
Protected: Renewal due
Application Date
16 January 2015
Registration Date
16 January 2015
Renewal Date
16 January 2025
Owner(s)
Service
Davies Collison Cave Pty Ltd
Goods and Services:
Class 7:
Installations consisting of machines for processing semiconductors, in particular for processing semiconductors under vacuum; installations for conveying semiconductors, the installations consisting of appliances for conveying goods; installations and systems for the surface treatment of semiconductors, the installations and systems consisting of machines for processing semiconductors; installations and systems for etching semiconductor surfaces, the installations and systems consisting of appliances for processing semiconductors; installations for vaporising semiconductor surfaces, in particular under vacuum (CVD processes), the installations consisting of machines for processing semiconductors; installations consisting of machines for providing semiconductors, namely automatic feeding devices, automatic loading and unloading facilities and facilities for inserting semiconductors; installations consisting of machines for conveying or processing of photoelectric elements; installations consisting of machines for providing photoelectric elements, namely automatic feeding devices, automatic loading and unloading facilities for inserting photoelectric elements; installations consisting of machines for conveying or processing flat screens; installations consisting of machines for providing flat screens, namely automatic feeding devices, automatic loading and unloading facilities and facilities for inserting flat screens
Installations consisting of machines for processing semiconductors, in particular for processing semiconductors under vacuum; installations for conveying semiconductors, the installations consisting of appliances for conveying goods; installations and systems for the surface treatment of semiconductors, the installations and systems consisting of machines for processing semiconductors; installations and systems for etching semiconductor surfaces, the installations and systems consisting of appliances for processing semiconductors; installations for vaporising semiconductor surfaces, in particular under vacuum (CVD processes), the installations consisting of machines for processing semiconductors; installations consisting of machines for providing semiconductors, namely automatic feeding devices, automatic loading and unloading facilities and facilities for inserting semiconductors; installations consisting of machines for conveying or processing of photoelectric elements; installations consisting of machines for providing photoelectric elements, namely automatic feeding devices, automatic loading and unloading facilities for inserting photoelectric elements; installations consisting of machines for conveying or processing flat screens; installations consisting of machines for providing flat screens, namely automatic feeding devices, automatic loading and unloading facilities and facilities for inserting flat screens
Class 9:
Hardware and software for operating systems and installations for the thermal treatment of surfaces and objects, or for thermal processes for modifying surfaces, in particular semiconductor surfaces, including diffusion furnaces, continuous furnaces, installations for vaporising semiconductor surfaces, burn-in ovens, vacuum furnaces; hardware and software for operating systems and installations for cleaning gases and exhaust gases, including flue gas purification equipment
Hardware and software for operating systems and installations for the thermal treatment of surfaces and objects, or for thermal processes for modifying surfaces, in particular semiconductor surfaces, including diffusion furnaces, continuous furnaces, installations for vaporising semiconductor surfaces, burn-in ovens, vacuum furnaces; hardware and software for operating systems and installations for cleaning gases and exhaust gases, including flue gas purification equipment
Class 11:
Systems and installations for thermal pre-treatment processes or manufacturing processes, namely diffusion furnaces, continuous furnaces, coating ovens, burn-in ovens, vacuum furnaces; installations consisting of separators for chemical vapour deposition, in particular under vacuum conditions (CVD processes); installations for processing and cleaning gases and exhaust gases; facilities for emitting exhaust gases into the environment, the facilities consisting of flues and installations for emitting exhaust gases to the environment; gas flares; sewage purification installations; sewage purification apparatus; sewage disposal installations
Systems and installations for thermal pre-treatment processes or manufacturing processes, namely diffusion furnaces, continuous furnaces, coating ovens, burn-in ovens, vacuum furnaces; installations consisting of separators for chemical vapour deposition, in particular under vacuum conditions (CVD processes); installations for processing and cleaning gases and exhaust gases; facilities for emitting exhaust gases into the environment, the facilities consisting of flues and installations for emitting exhaust gases to the environment; gas flares; sewage purification installations; sewage purification apparatus; sewage disposal installations