Trademark: SHIN-ETSU 1193586
Word
SHIN-ETSU
ID
1193586
Trademark Type
Fancy
Status
Protected: Registered/protected
Application Date
28 March 2007
Registration Date
28 March 2007
Renewal Date
28 March 2027
Owner(s)
Service
Refer to WIPO address for Correspondence
Goods and Services:
Class 1:
Organosilanes; chemical emulsions; antifoams; foaming control agents; mold release agents; paper release agents; textile treating agents; paint additives; additives for plastics; additives for cosmetics and toiletries; water repellants; silicone coatings for optical fibers; silanes; silane coupling agents; silicone coatings for junction of semiconductors; silicone adhesives; catalysts; curing agents; vinyl acetate monomer; vinyl chloride monomer; epoxy encapsulating materials for semiconductors and optical devices; methanol; caustic soda; cellulose ethers; synthetic pheromones; silicon carbide; gallium phosphide for semiconductor; aluminium gallium indium phosphide for semiconductor; gallium arsenide for semiconductor; photosensitive chemicals for semiconductor lithography; aroma chemicals; rare earth compounds; other chemicals for industrial use
Organosilanes; chemical emulsions; antifoams; foaming control agents; mold release agents; paper release agents; textile treating agents; paint additives; additives for plastics; additives for cosmetics and toiletries; water repellants; silicone coatings for optical fibers; silanes; silane coupling agents; silicone coatings for junction of semiconductors; silicone adhesives; catalysts; curing agents; vinyl acetate monomer; vinyl chloride monomer; epoxy encapsulating materials for semiconductors and optical devices; methanol; caustic soda; cellulose ethers; synthetic pheromones; silicon carbide; gallium phosphide for semiconductor; aluminium gallium indium phosphide for semiconductor; gallium arsenide for semiconductor; photosensitive chemicals for semiconductor lithography; aroma chemicals; rare earth compounds; other chemicals for industrial use